Conventional evaporation as well as IAD and IBS processes were used to develop low-loss dielectric mirrors and antireflection coatings for the wavelength range 130 to 250 nm. First, single layers of SiO2, Al2O3, HfO2, AlF3, MgF2, LaF3, NdF3, and GdF3 were deposited. The refractive indices, extinction coefficients and packing densities of the layers were determined by spectrophotometric methods in order to investigate their dependence on deposition parameters. With optimized parameters, HR and AR coatings were deposited. Their transmission and reflection coefficients were measured and compared to values calculated from single layer data and interface roughness data. Integrated scatter measurements were performed on single layers as well as AR and HR coatings for 248 nm. Results of damage threshold measurements at 193 and 248 nm are presented.