Table-top EUV-Reflectometer
SPIE Advanced Lithography: Emerging Lithographic Technologies
19. Februar
San Jose
2006
Type: Konferenzbeitrag
DOI: 10.1117/12.656060
Abstract
A novel compact EUV-reflectometer recently developed is presented. The designconcept relies on a flexible approach, thus this reflectometer can be set up as a compact table-top tool for a specified task as well as a full all-purpose reflectometer. As an EUV-source an electron-based microfocus EUV-tube is used. This EUV source is debris-free and provides a typical output of 30μW at 13.5 nm. The reflectometer benefits from the very good long-time stability and spatial stability of this tube. Reflectivity measurements from grazing incidence to nearly normal incidence as well as transmission studies can be realized in the same setup at a typical precision of measurements of 0.5\%. A precise computer-controlled positioning unit allows to vary and scan all important parameters online, allowing for example complex surface scans and angle variations. The concept of the reflectometer is discussed and recent results are presented. This device can be purchased from the Laser Zentrum Hannover e.V.