Femtosecond laser lithography and applications
SPIE Photonics West: LASE
21.-26. Januar
San Jose
2006
Type: Konferenzbeitrag
DOI: 10.1117/12.651664
Abstract
Rapid progress in ultrafast laser systems opened many exciting possibilities for high-resolution material processing. These laser systems allow to control and deliver optical energy and laser pulses in time and space with unprecedented precision. It is not surprising that these high-quality optical pulses have revolutionized microfabrication technologies. Femtosecond lasers enabled processing of a wide range of materials (including heat sensitive and thermo reactive) with a sub-micrometer resolution. At present, nearly arbitrary shaped 2D and 3D structures can be produced by direct write photofabrication techniques using femtosecond laser pulses. In this paper we present a brief review of our recent progress in femtosecond (maskless, direct-write, nonlinear) laser lithography and 3D photofabrication technique.