The depth profiles of 40-keV cobalt, chromium, and copper ions implanted into a titanium dioxide matrix at doses of 1016–1017 ions/cm2 are simulated with the DYNA software package. Its algorithm is based on the effects of pair collisions of introduced ions with substrate atoms, which result in a dynamic change in the elemental composition of the near-surface layer in the irradiated material, and takes into account surface sputtering. The results obtained are compared with the standard statistical distribution calculated by the TRIM algorithm.