Compact electron-based extreme ultraviolet source at 13.5 nm | Laser Zentrum Hannover

A. Egbert

B. Mader

B. Tkachenko

A. Ostendorf

B. N. Chichkov

T. Mißalla

M. C. Schürmann

K. Gäbel

G. Schriever

U. Stamm

Compact electron-based extreme ultraviolet source at 13.5 nm

SPIE Emerging Lithographic Technologies

25.-27. Februar

Santa Clara

2003

Type: Konferenzbeitrag

Abstract