Sputter deposition processes, in particular ion-beam sputtering (IBS), are preferred methods for the production of sophisticated, functional coatings on optical components. Generally, sputter deposition processes have shown the highest level of coating reproducibility and process stability over the course of time. However, recent studies indicate that the magnitude of errors concerning the reproducibility of the dispersion data of fabricated coatings is quite comparable between classical IBS, PIAD, and magnetron sputtering processes [1]. Furthermore, changes to the uniformity of the coatingmaterial distribution inside of the substrate plane, for instance after servicing the ion-source grids, are widely observed. In particular, these issues are of concern for the production of coatings on an industrial scale, when a high reproducibility of the deposited layer systems across the substrate holder and from run to run is mandatory. Because fixed parameter sets without an in-situ control are still used today, an adaptive IBS control scheme has considerable potential to allow for a further increase of the process reproducibility facing different kinds of disturbances to the process. To this day, preliminary work for the implementation of a closed-loop control scheme for the IBS coating process was performed, combining several in- and ex-situ measurement methods. This includes process-plasma and ion-beam diagnostics, monitoring of the process gas atmosphere, and determining the coating rate distribution as well as the optical constants of the coating materials. The present contribution gives an overview of the so far utilized measurement methods and identified influence factors within the IBS coating process and presents the current approaches to a future, adaptive IBS process.