During the last years, optical low loss components gained more and more industrial interest and led to novel approaches for the production in optical coating technology. The application of filtered deposition technologies promises a significant reduction of particle contamination. Usually, filtered techniques are applied in combination with processes which produce a high level of undesired particles, like the cathodic arc deposition. In the present contribution, a magnetic field filter is applied in combination with a high quality ion beam sputtering process. The focus of the investigation constitutes the modulation of the guiding process with respect to the guiding efficiency. Numerical investigations reveal the trajectories of the ions during the guiding process and allow to analyze the influence of the magnetic field and the resulting electrostatic potential. In this study, the guiding effect is observed to be dominated by the electric potential compared to the magnetic field. However according to the simulations, very high ion guiding efficiencies can be achieved using moderate magnetic fields and electrical potentials. Furthermore, it is demonstrated that the experiemental and calculated efficiencies agree well. Consequently, the simulation is the basis for a further optimization of the filtered ion beam sputtering processes.